Role of hydrogen on the deposition and properties of fluorinated silicon-nitride films prepared by inductively coupled plasma enhanced chemical vapor deposition using SiF4/N-2/H-2 mixtures.
Fandino, J. Santana, G. Rodriguez-Fernandez, L. Cheang-Wong, J.C. Ortiz, A. Alonso, J.C
Role of hydrogen on the deposition and properties of fluorinated silicon-nitride films prepared by inductively coupled plasma enhanced chemical vapor deposition using SiF4/N-2/H-2 mixtures. - 2005. - Vol. 23, no. 2, pp. 248-255. = Journal of Vacuum Science and Technology A: Vacuum, Surface, and Films
Role of hydrogen on the deposition and properties of fluorinated silicon-nitride films prepared by inductively coupled plasma enhanced chemical vapor deposition using SiF4/N-2/H-2 mixtures. - 2005. - Vol. 23, no. 2, pp. 248-255. = Journal of Vacuum Science and Technology A: Vacuum, Surface, and Films