Polymorphous silicon thin films obtained by plasma-enhanced chemical vapor deposition using dichlorosilane as silicon precursor.
Remolina, A. Monroy, B.M. Garcia-Sanchez, M.F. Ponce, A. Bizarro, M. Alonso, J.C. Ortiz, A. Santana, G.
Polymorphous silicon thin films obtained by plasma-enhanced chemical vapor deposition using dichlorosilane as silicon precursor. - 2009. - Vol. 20, no. 24, No. Art. 245604. = Nanotechnology
Polymorphous silicon thin films obtained by plasma-enhanced chemical vapor deposition using dichlorosilane as silicon precursor. - 2009. - Vol. 20, no. 24, No. Art. 245604. = Nanotechnology