Passivation properties of nitric/phosphoric etching on CdTe films: influence of the etching time and nitric acid concentration.
Vigil-Galan, O. Cruz-Orea, A. Mejia-Garcia, C. Fandiño, J. Garcia-Sanchez, M.F.
Passivation properties of nitric/phosphoric etching on CdTe films: influence of the etching time and nitric acid concentration. - 2011. - Vol. 519, No. 21, pp. 7164-7167. = Thin Solid Films
Passivation
Photoacoustic
Photoluminescence
CdTe
Thin film
Surface recombination velocity
Passivation properties of nitric/phosphoric etching on CdTe films: influence of the etching time and nitric acid concentration. - 2011. - Vol. 519, No. 21, pp. 7164-7167. = Thin Solid Films
Passivation
Photoacoustic
Photoluminescence
CdTe
Thin film
Surface recombination velocity