Remolina, A. Monroy, B.M. Garcia-Sanchez, M.F. Ponce, A. Bizarro, M. Alonso, J.C. Ortiz, A. Santana, G. <br/><br/>
Polymorphous silicon thin films obtained by plasma-enhanced chemical vapor deposition using dichlorosilane as silicon precursor. 

 -  2009. 
 - Vol. 20, no. 24, No. Art. 245604. 
 = Nanotechnology