| 000 | 00896nam a2200277zi 4500 | ||
|---|---|---|---|
| 005 | 20230621111032.0 | ||
| 008 | 040204c20032003maua b 001 0 eng | ||
| 020 | _a140207543X | ||
| 035 | _aMX001000985450 | ||
| 040 |
_aDLC _bspa _cDLC _dC#P _dUKM _dOHX _dUNAMX |
||
| 041 | _aENG | ||
| 050 | 0 | 0 |
_aTS695 _bB37 |
| 082 | 0 | 0 |
_a621.3815/2 _221 |
| 084 | _aGeneral | ||
| 100 | 1 |
_aBarnat, Edward V., _eautor |
|
| 245 | 1 | 0 |
_aPulsed and pulsed bias sputtering : _bprinciples and applications / _cby Edward V. Barnat, Toh-Ming Lu |
| 264 | 1 |
_aBoston : _bKluwer Academic, _cc2003 |
|
| 300 |
_ax, 155 páginas : _bilustraciones |
||
| 650 | 0 | _aPulverización catódica (Metalización) | |
| 650 | 0 | _aPelículas delgadas | |
| 700 | 1 |
_aLu, Toh-Ming, _d1943- , _eautor |
|
| 336 |
_atexto _2rdacontent |
||
| 337 |
_asin medio _2rdamedia |
||
| 338 |
_avolumen _2rdacarrier |
||
| 999 |
_c12202 _d12202 |
||