| 000 | 00775nam a2200229 a 4500 | ||
|---|---|---|---|
| 008 | 970106s1985^^^^^^^a^^^^^^^^^^000^0^eng^^ | ||
| 020 | _a0-471-86960-0 | ||
| 035 | _aMX001000384514 | ||
| 050 |
_aTK7871.85 _bH3313 |
||
| 084 | _aGeneral | ||
| 245 | 0 | 0 |
_aApplications of plasma processes to vlsi technology / _cEd. by takuo sugano ; translated by hyo-gun kim |
| 264 | 1 |
_aNew York : _bJ. Wiley, _cc1985 |
|
| 300 | _a394 páginas | ||
| 336 |
_atexto _2rdacontent |
||
| 337 |
_asin medio _2rdamedia |
||
| 338 |
_avolumen _2rdacarrier |
||
| 500 | _aTraduccion de: handotai purazama purosesugijutsu | ||
| 650 | 0 |
_aPlasma _xGrabado |
|
| 650 | 0 |
_aSemiconductores _xGrabado |
|
| 650 | 0 | _aGalvanoplastia al vapor | |
| 650 | 0 | _aCircuitos integrados en muy gran escala | |
| 999 |
_c2571 _d2571 |
||