000			01466nam a2200373zi 4500
003			$$aDLC
005			20230621110807.0
008			970429s1994 dcua b 101 0 eng
020			_a0841228485 (papel alcalino)
035			_aMX001000736089
040			_aDLC _cDLC _dDLC
041			_aENG
050	0	0	_aTR940 _bI57 1994
082	0	0	_a621.3815/31 _220
084			_aGeneral
245	0	0	_aIntroduction to microlithography / _cedited by Larry F. Thompson, C. Grant Willson, Murrae J. Bowden
250			_a2nd ed.
264		1	_aWashington, D.C. : _bAmerican Chemical Society, _c1994
300			_axiv, 527 páginas : _bilustraciones ;
490	0		_aACS professional reference book
504			_aIncluye referencias bibliograficas e indices.
505	0		_aContenido: Larry F. Thompson -- The lithographic process / Murrae J. Bowden -- Organic resist materials / C. Grant Willson -- Resist processing / Larry Thompson -- Plasma etching / J.A. Mucha, D.W. Hess, and E.S. Aydil.
650		0	_aMicrolitografia _vCongresos
650		0	_aFotorreservas _vCongresos
650		0	_aAtaque por plasma _vCongresos
650		0	_aSemiconductores _xGrabado _vCongresos
700	1	0	_aThompson, L. F., _d1944- , _eeditor
700	1	0	_aWillson, C. G. _q(C. Grant), _d1939- , _eeditor
700	1	0	_aBowden, M. J., _d1943- , _eeditor
336			_atexto _2rdacontent
337			_asin medio _2rdamedia
338			_avolumen _2rdacarrier
999			_c7964 _d7964